LithoGRPO: Fast Inverse Lithography via GRPO Reinforced Flow Matching

In three linesLithoGRPO combines flow matching with GRPO-based reinforcement learning to optimize lithography masks in semiconductor manufacturing. The framework integrates explicit physics-based reward functions and proposes a fast shot-counting algorithm achieving 130x speedup. State-of-the-art results over optimization and learning-based methods.

Summary generated by Claude — human-verified